Material and electrical characterization of HfO2 films for MIM capacitors application

Materials Research Society Symposium - Proceedings

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Bibliographic Details
Main Authors: Hu, H., Zhu, C., Lu, Y.F., Wu, Y.H., Liew, T., Li, M.F., Cho, B.J., Choi, W.K., Yakovlev, N.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83937
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Institution: National University of Singapore

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