Material and electrical characterization of HfO2 films for MIM capacitors application
Materials Research Society Symposium - Proceedings
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Main Authors: | Hu, H., Zhu, C., Lu, Y.F., Wu, Y.H., Liew, T., Li, M.F., Cho, B.J., Choi, W.K., Yakovlev, N. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83937 |
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Institution: | National University of Singapore |
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