New developments in Schottky source/drain high-k/metal gate CMOS transistors

New developments in Schottky source/drain high-k/metal gate CMOS transistors

Proceedings - Electrochemical Society

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Bibliographic Details
Main Authors:	Li, M.-F., Lee, S., Zhu, S., Li, R., Chen, J., Chin, A., Kwong, D.L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/84006
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Institution:	National University of Singapore

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