Source/drain germanium condensation for P-channel strained ultra-thin body transistors
Technical Digest - International Electron Devices Meeting, IEDM
Saved in:
Main Authors: | Chui, K.-J., Ang, K.-W., Madan, A., Wang, H., Tung, C.-H., Wong, L.-Y., Wang, Y., Choy, S.-F., Balasubramanian, N., Li, M.F., Samudra, G., Yeo, Y.-C. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/84207 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Strained thin-body p-MOSFET with condensed silicon-germanium source/ drain for enhanced drive current performance
by: Ang, K.-W., et al.
Published: (2014) -
Strain optimization in ultrathin body transistors with silicon-germanium source and drain stressors
by: Madan, A., et al.
Published: (2014) -
Germanium source and drain stressors for ultrathin-body and nanowire field-effect transistors
by: Liow, T.-Y., et al.
Published: (2014) -
Strained n-channel transistors with silicon source and drain regions and embedded silicon/germanium as strain-transfer structure
by: Ang, K.-W., et al.
Published: (2014) -
Strained silicon nanowire transistors with germanium source and drain stressors
by: Liow, T.-Y., et al.
Published: (2014)