Study of interactions between α-Ta films and SiO2 under rapid thermal annealing

Study of interactions between α-Ta films and SiO2 under rapid thermal annealing

10.1016/j.tsf.2004.05.056

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Bibliographic Details
Main Authors: Yuan, Z.L., Zhang, D.H., Li, C.Y., Prasad, K., Tan, C.M.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Article
Published: 2014
Subjects:
α-Ta
Cu metallization
Diffusion barrier
Rapid thermal annealing
SiO2
Online Access:http://scholarbank.nus.edu.sg/handle/10635/90220
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Institution: National University of Singapore

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