Development of the lithographic sources and processes for device fabrication
The aim of this project was to develop lithographic sources and processes for device fabrication. The NX2 was developed to become a reliable x-ray source for operation in neon.
Saved in:
Main Authors: | Wong, Terence Kin Shun, Lee, Sing, Xu, Shuyan, Lee, Paul Choon Keat, Tan, Augustine Tuck Lee, Rawat, Rajdeep Singh, Liu, Mahe, Ostrikov, Kostyantyn, Vladimir Koudriachov, Li, Yin An |
---|---|
Other Authors: | School of Electrical and Electronic Engineering |
Format: | Research Report |
Published: |
2008
|
Subjects: | |
Online Access: | http://hdl.handle.net/10356/2796 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Similar Items
-
Demonstration lithography using plasma focus soft x-ray source
by: Lee, Sing, et al.
Published: (2008) -
Plasma radiation sources for X-ray lithography and neutron analysis applications
by: Lee, Sing, et al.
Published: (2008) -
A steady-state RF inductively coupled plasma source for plasma processing
by: Xu, Shuyan, et al.
Published: (2008) -
GA based hybrid tier packing approach for three dimensional packing
by: Poh, Terence Eng Hua
Published: (2008) -
Fabrication and characterization of silicon-on-insulator using low temperature wafer bonding
by: Yu, Weibo
Published: (2008)