Characterization and modeling of negative bias temperature instability in P-MOSFETs
This thesis is concerned with the study of negative bias temperature instability (NBTI) in p-MOSFETs. A simple characterization method based on the single-point measurement of the saturated drain current is first proposed to minimize the unwanted recovery effect during the NBTI measurement. A study...
Saved in:
Main Author: | Yang, Jianbo |
---|---|
Other Authors: | Chen Tupei |
Format: | Theses and Dissertations |
Language: | English |
Published: |
2010
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/35246 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Similar Items
-
Characterization of negative bias temperature instability in ultra-thin oxynitride gate P-MOSFETs
by: Wang, Shuang
Published: (2009) -
Negative-bias temperature instability (NBTI) characterization of MOSFETS employing decoupled-plasma-nitrided gate oxides
by: Lai, Simon Chung Sing
Published: (2011) -
Bias temperature instability of nano-scale silicon transistors
by: Ho, Terence Jun Jie
Published: (2014) -
Evolution of hole trapping in the oxynitride gate p-MOSFET subjected to negative-bias temperature stressing
by: Boo, A. A., et al.
Published: (2013) -
Correlation between oxide trap generation and negative-bias temperature instability
by: Boo, A. A., et al.
Published: (2013)