Defect states responsible for leakage current in Ta2O5 films on Si due to Si contamination from the substrate
Journal of Applied Physics
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Main Authors: | Lau, W.S., Khaw, K.K., Qian, P.W., Sandler, N.P., Chu, P.K. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/80346 |
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Institution: | National University of Singapore |
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