Issues and controversies in NBTI degradation and recovery mechanisms for p-MOSFETs with SiON gate dielectrics
10.1109/ICSICT.2008.4734611
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Main Authors: | Li, M.-F., Huang, D., WJLiu, ZYLiu, Luo, Y., CCLiao, LFZhang, ZHGan, Wong, W. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/70704 |
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Institution: | National University of Singapore |
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