A high performance MIM capacitor using HfO 2 dielectrics
10.1109/LED.2002.802602
Saved in:
Main Authors: | Hu, H., Zhu, C., Lu, Y.F., Li, M.F., Cho, B.J., Choi, W.K. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/81872 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
MIM capacitors using atomic-layer-deposited high-κ (HfO2)1-x(Al2O3)x dielectrics
by: Hu, H., et al.
Published: (2014) -
PVD HfO2 for high-precision MIM capacitor applications
by: Kim, S.J., et al.
Published: (2014) -
A high-density MIM capacitor (13 fF/μm2) using ALD HfO2 dielectrics
by: Yu, X., et al.
Published: (2014) -
Lanthanide (Tb)-doped HfO2 for high-density MIM capacitors
by: Kim, S.J., et al.
Published: (2014) -
High-density MIM capacitors using AlTaOx dielectrics
by: Yang, M.Y., et al.
Published: (2014)