HfO2 gate dielectrics for future generation of CMOS device application
Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors
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Main Authors: | Yu, H.Y., Kang, J.F., Ren, C., Li, M.F., Kwong, D.L. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82446 |
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Institution: | National University of Singapore |
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