SiGe on insulator MOSFET integrated with Schottky source/drain and HfO 2/TaN gate stack

• Main Authors: Gao, F., Lee, S.J., Rui, L., Wang, S.J., Cho, B.J., Balakumar, S., Tung, C.-H., Chi, D.Z., Kwong, D.L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83016
• Institution: National University of Singapore

10.1149/1.2197127