A new expandible ZnS-SiO2 liner stressor for n-channel FinFETs

Digest of Technical Papers - Symposium on VLSI Technology

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Bibliographic Details
Main Authors: Ding, Y., Tong, X., Zhou, Q., Liu, B., Gyanathan, A., Tong, Y., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83379
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Institution: National University of Singapore

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