N-type Schottky barrier source/drain MOSFET using Ytterbium silicide
10.1109/LED.2004.831582
Saved in:
Main Authors: | Zhu, S., Chen, J., Li, M.-F., Lee, S.J., Singh, J., Zhu, C.X., Du, A., Tung, C.H., Chin, A., Kwong, D.L. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82789 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Schottky barrier source/drain n-mosfet using ytterbium silicide
by: ZHU, SHIYANG, et al.
Published: (2012) -
N-channel FinFETs with 25-nm gate length and Schottky-Barrier source and drain featuring Ytterbium silicide
by: Lee, R.T.P., et al.
Published: (2014) -
Fabrication of poly-Si TFT with silicided Schottky barrier source/drain, high-κ gate dielectric and metal gate
by: Zhu, S., et al.
Published: (2014) -
Low temperature MOSFET technology with Schottky barrier source/drain, high-K gate dielectric and metal gate electrode
by: Zhu, S., et al.
Published: (2014) -
Drivability improvement in Schottky barrier source/drain MOSFETs with strained-Si channel by Schottky barrier height reduction
by: Zhu, S., et al.
Published: (2014)