Fast and slow dynamic NBTI components in p-MOSFET with SiON dielectric and their impact on device life-time and circuit application
10.1109/.2005.1469225
Saved in:
Main Authors: | Yang, T., Li, M.F., Shen, C., Ang, C.H., Zhu, C., Yeo, Y.C., Samudra, G., Rustagi, S.C., Yu, M.B., Kwong, D.L. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83730 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Fast DNBTI components in p-MOSFET with SiON dielectric
by: Yang, T., et al.
Published: (2014) -
Characterization and physical origin of fast vth Transient in NBTI of pMOSFETs with SiON dielectric
by: Shen, C., et al.
Published: (2014) -
Interface trap passivation effect in NBTI measurement for p-MOSFET with SiON gate dielectric
by: Yang, T., et al.
Published: (2014) -
The physical origins of fast and slow components in NBTI degradation for p-MOS transistors with SiON gate dielectric
by: Li, M.-F., et al.
Published: (2014) -
Issues and controversies in NBTI degradation and recovery mechanisms for p-MOSFETs with SiON gate dielectrics
by: Li, M.-F., et al.
Published: (2014)