Dopant-free FUSI PtxSi metal gate for high work function and reduced Fermi-level pinning
10.1109/LED.2005.857711
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Main Authors: | Park, C.S., Cho, B.J. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82170 |
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Institution: | National University of Singapore |
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