Investigation of etching properties of HfO based high-K dielectrics using inductively coupled plasma

• Main Authors: Chen, J., Yoo, W.J., Tan, Z.Y.L., Wang, Y., Chan, D.S.H.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83862
• Institution: National University of Singapore

10.1116/1.1705590