Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications

Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications

10.1063/1.1758297

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書目詳細資料
Main Authors:	Gupta, R., Yoo, W.J., Wang, Y., Tan, Z., Samudra, G., Lee, S., Chan, D.S.H., Loh, K.P., Bera, L.K., Balasubramanian, N., Kwong, D.-L.
其他作者:	ELECTRICAL & COMPUTER ENGINEERING
格式:	Article
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/82378
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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