On-the-fly interface trap measurement and its impact on the understanding of NBTI mechanism for p-MOSFETs with SiON gate dielectric
10.1109/IEDM.2007.4419072
Saved in:
Main Authors: | Liu, W.J., Liu, Z.Y., Huang, D., Liao, C.C., Zhang, L.F., Gan, Z.H., Wong, W., Shen, C., Li, M.-F. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/84043 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Interface trap passivation effect in NBTI measurement for p-MOSFET with SiON gate dielectric
by: Yang, T., et al.
Published: (2014) -
Studies of NBTI in pMOSFETs with thermal and plasma nitrided SiON gate oxides by OFIT and FPM methods
by: Liu, W.J., et al.
Published: (2014) -
Issues and controversies in NBTI degradation and recovery mechanisms for p-MOSFETs with SiON gate dielectrics
by: Li, M.-F., et al.
Published: (2014) -
New insights of BTI degradation in MOSFETs with SiON gate dielectrics
by: Li, M.-F., et al.
Published: (2014) -
Characteristics of NBTI in pMOSFETs with thermally and plasma nitrided gate oxides
by: Liu, W.J., et al.
Published: (2014)